The user suggests that ASML is not responsible for potential IP leaks regarding EUV lithography, instead alleging that TSMC is the more likely source. While Huawei is reportedly aiming for EUV machine use by 2028-2030, the author claims China's current prototype is a non-scalable "Frankenstein machine" incapable of high-volume production. Additionally, a massive upgrade cycle is currently underway for EUV machines to increase power and throughput.